Optical and electrical properties of chemically deposited CdS thin films modified by air annealing

E. Gluszak, S. Hinckley
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引用次数: 1

Abstract

Polycrystalline CdS thin films have been grown by chemical bath deposition (CBD) using cadmium acetate and thiourea as the Cd and S ion sources. The as-deposited films show a low degree of crystallinity, are very resistive (conductivity /spl sim/10/sup -7/ /spl Omega//sup -1//spl middot/cm/sup -1/) and possess a small degree of photosensitivity. Air annealing of the films at 100-400/spl deg/C for 1 hr converts them to n-type through partial conversion of CdS to CdO. This is accompanied by an increase in the photoconductivity by more than 6 orders of magnitude. The optical bandgaps of the as-deposited films were >2.38 eV, which decreased to /spl sim/2.24 eV after air annealing.
空气退火改性化学沉积CdS薄膜的光学和电学性质
以乙酸镉和硫脲为Cd和S离子源,采用化学浴沉积法制备了多晶CdS薄膜。沉积的薄膜结晶度低,电阻率高(电导率/spl sim/10/sup -7/ /spl Omega//sup -1//spl middot/cm/sup -1/),光敏性小。在100-400/spl℃下空气退火1小时,通过将CdS部分转化为CdO,将薄膜转化为n型。这是伴随着光电导率增加超过6个数量级。沉积薄膜的光学带隙>2.38 eV,经空气退火后降至/spl sim/2.24 eV。
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