Temperature and process independent ring-oscillator using compact compensation technic

Jianguo Tang, Fang Tang
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引用次数: 12

Abstract

The parameters of CMOS device will be affected by the variation of temperature and process variation. Due to these variations, a ring oscillator implemented in CMOS process will not have an constant output frequency which is designed in CAD tools. In order to get a constant frequency, additional circuit is needed to compensate the variation in both temperature and process. After investigate the drawback of the state of art design, a modified structure is proposed, which don't need to use an op-amp to boost the compensation bias voltage up. Because no need of the boosting op-amp, the compensation circuit will get benefits to offset voltage, power consumption, loading effect and chip area, etc. According to the Cadence simulation result based on TSMC 0.18µm RF CMOS process, less than 2% frequency variation is obtained from −40 to 125 °C in three different process corners (SS/TT/FF). The total core power consumption is less than 220uW, except the external LDO.
采用紧凑补偿技术的温度与工艺无关的环形振荡器
CMOS器件的参数会受到温度变化和工艺变化的影响。由于这些变化,在CMOS工艺中实现的环形振荡器将不具有在CAD工具中设计的恒定输出频率。为了获得恒定的频率,需要额外的电路来补偿温度和过程的变化。在分析了现有设计的不足之处后,提出了一种不需要使用运放来提高补偿偏置电压的改进结构。由于不需要升压运放,补偿电路在偏置电压、功耗、负载效果和芯片面积等方面都有好处。基于台积电0.18µm RF CMOS工艺的Cadence仿真结果表明,在- 40 ~ 125°C范围内,三个不同工艺角(SS/TT/FF)的频率变化小于2%。除外置LDO外,核心总功耗小于220uW。
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