K. Bhattacharyya, A. D. den Boef, G. Storms, Joost van Heijst, M. Noot, Kevin An, Noh-Kyoung Park, Se-Ra Jeon, Nang-Lyeom Oh, Elliott McNamara, Frank van de Mast, SeungHwa Oh, S. Y. Lee, C. Hwang, Kuntack Lee
{"title":"A study of swing-curve physics in diffraction-based overlay","authors":"K. Bhattacharyya, A. D. den Boef, G. Storms, Joost van Heijst, M. Noot, Kevin An, Noh-Kyoung Park, Se-Ra Jeon, Nang-Lyeom Oh, Elliott McNamara, Frank van de Mast, SeungHwa Oh, S. Y. Lee, C. Hwang, Kuntack Lee","doi":"10.1117/12.2222040","DOIUrl":null,"url":null,"abstract":"With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection. In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.","PeriodicalId":193904,"journal":{"name":"SPIE Advanced Lithography","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-03-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"24","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Advanced Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2222040","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 24
Abstract
With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection. In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.
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