KrF Lithography for Si based 2D honey comb lattice pillars

2006 IEEE Conference on Emerging Technologies - Nanoelectronics Pub Date : 2006-03-27 DOI:10.1109/NANOEL.2006.1609749

S. S. Mehta, B. Murthy, N. Singh

引用次数: 0

Abstract

We report 248 nm KrF lithography techniques to fabricate two dimensional (2D) honey comb lattice photonic crystal on 8-inch silicon substrate . Through R-soft simulation we find maximum transverse magnetic (TM) band gap at normalized frequency of 0.322 and pillar diameter of 0.210 um for a lattice constant of 0.5 um . Experimental results show 0.214 um pillar diameter at pitch 0.5 um with good process latitude which is very close to R-soft simulation result

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硅基二维蜂窝状晶格柱的KrF光刻技术

我们报道了248 nm KrF光刻技术在8英寸硅衬底上制备二维蜂窝状晶格光子晶体。通过R-soft仿真，我们发现当晶格常数为0.5 um时，在归一化频率为0.322、柱径为0.210 um时，横磁(TM)带隙最大。实验结果表明，柱径为0.214 um，节距为0.5 um，工艺纬度较好，与R-soft仿真结果非常接近

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2006 IEEE Conference on Emerging Technologies - Nanoelectronics

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