Characterization and Operation of Graphene-Oxide-Semiconductor Emitters at Atmospheric Pressure Levels

F. Herdl, Maximillian J. Kueddelsmann, A. Schels, M. Bachmann, S. Edler, Dominik Wohlfartsstätter, F. Düsberg, Alexander Prugger, Michael Dillig, F. Dams, R. Schreiner, C. Coileáin, S. Zimmermann, A. Pahlke, G. Duesberg
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Abstract

In recent years Graphene-Oxide-Semiconductor (GOS) electron emitters have attracted a lot of interest due to their outstanding durability in modest vacuum conditions. However, the performance at ambient pressure remains largely unexplored. In this study GOS-emitters are characterized in nitrogen and air at atmospheric pressure, and compared with their vacuum characteristics. For this purpose, lifetime and IV-characteristics measurements are shown. Furthermore, the GOS-emitter was operated as an ionization source for ion mobility spectrometry (IMS) at ambient conditions.
石墨烯-氧化物-半导体发射体在大气压下的特性和运行
近年来,石墨烯氧化物半导体(GOS)电子发射体因其在适度真空条件下的优异耐久性而引起了人们的广泛关注。然而,在环境压力下的性能仍未得到充分研究。本文研究了常压下氮和空气中氧化石墨烯发射体的特性,并与它们的真空特性进行了比较。为此,显示了寿命和iv特性测量值。此外,在环境条件下,将goes发射器作为离子迁移率光谱(IMS)的电离源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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