Model-based specification, analysis and synthesis of servo controllers for lithoscanners

Abstract

ASML is the world's leading provider of complex lithography systems for the semiconductor industry. Such systems consist of numerous servo control systems. To design such control systems, a multi-disciplinary model-based development environment has been developed. It is based on a set of domain specific languages (DSLs) describing A) the transducers and control logic, i.e. the application; B) the relevant subset of the hardware, i.e. the platform; and C) the mapping of the application on the platform. Models specified with these DSLs are used for different types of analysis, for example load prediction of computing nodes and networks between them. Furthermore, the behavioral specification present in the models is transformed into efficient C code that is executed in a hard real-time setting. Finally, the models are used during startup of a twinscanner to initialize the servo controllers and their execution platforms, and to schedule the control blocks on the computing nodes.