Comprehensive Study on Injection Velocity Enhancement in Dopant-Segregated Schottky MOSFETs

A. Kinoshita, T. Kinoshita, Y. Nishi, K. Uchida, S. Toriyama, R. Hasumi, J. Koga
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引用次数: 21

Abstract

The carrier transport in dopant-segregated Schottky (DSS) and conventional MOSFETs was thoroughly investigated in terms of carrier injection velocity, vinj. It was found that vinj enhancement associated with the velocity overshoot enhances the current drivability in DSS, in addition to the reduction of parasitic resistance. A physical-based model was newly developed to explain the velocity overshoot behavior and reproduced the experimental data very well. Moreover, a novel type of DSS FinFET to take full advantage of the velocity overshoot was proposed and demonstrated as a primary study
掺杂分离肖特基mosfet中注入速度增强的综合研究
从载流子注入速度vinj的角度研究了掺杂分离肖特基(DSS)和传统mosfet中的载流子输运。研究发现,与速度超调相关的vinj增强除了降低寄生电阻外,还增强了DSS中的电流可驾驶性。建立了一个物理模型来解释速度超调行为,并能很好地再现实验数据。此外,提出了一种充分利用速度超调的新型DSS FinFET,并进行了初步研究
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