Optimization and Analysis Techniques for the Deep Submicron Regime

VLSI design (Print) Pub Date : 1900-01-01 DOI:10.1109/VLSID.2001.10019

N. Menezes, S. Sapatnekar

引用次数: 0

Abstract

Scaling in the deep submicron (DSM) regime has fundamentally altered the primary issues affecting VLSI design. The emergence of DSM-related problems has resulted in a proliferation of design techniques that attempt to alleviate these newer effects in current flows. However, future design methodologies would be required to undergo a paradigm shift to comprehensively address these problems. A few of these newer problems are listed below:

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深亚微米区优化与分析技术

在深亚微米(DSM)制度的缩放已经从根本上改变了影响超大规模集成电路设计的主要问题。dsm相关问题的出现导致了设计技术的激增，这些技术试图减轻当前流程中的这些新影响。然而，未来的设计方法将需要经历范式转变，以全面解决这些问题。下面列出了一些较新的问题:

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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VLSI design (Print)

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