The problem of breakdown in MODFETs

A. Hulsmann, W. Bronner, K. Kohler, M. Baeumler, J. Braunstein, P. Tasker
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Abstract

Understanding the breakdown mechanisms in FETs is a key factor in designing high power MMICs. The breakdown can be improved by reducing the electric field at the drain, and the gate leakage current. For MESFETs the drain field can be reduced by increasing the distances between the drain and gate contact. This leads to asymmetric source-gate and gate-drain spacings. For MODFETs with recessed gates, asymmetric designs are not successful in increasing the breakdown voltage because there is a low potential drop in the highly doped cap. Therefore wide etched gate recesses are required, but because of the symmetric etch processes, the source resistance is enhanced leading to a degradation in extrinsic transconductance. An other possibility for improving MODFET breakdown behaviour, is the use of surface depleted caps. However these MODFETs result in source current saturation in the 2DEG leading to an increase of the source and drain resistances at high currents.
modfet中的击穿问题
了解场效应管的击穿机制是设计高功率mmic的关键因素。可以通过减小漏极处的电场和栅极漏电流来改善击穿。对于mesfet,可以通过增加漏极和栅极接触之间的距离来减小漏极场。这导致了不对称的源栅极和栅极漏极间隔。对于具有凹槽栅极的modfet,不对称设计不能成功地提高击穿电压,因为高掺杂帽的电位降很低。因此需要宽的蚀刻栅极凹槽,但由于对称蚀刻工艺,源电阻增强,导致外部跨导下降。改善MODFET击穿行为的另一种可能性是使用表面耗尽帽。然而,这些modfet导致源电流在2℃饱和,导致高电流下源极和漏极电阻的增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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