Study of InAlGaN/GaN HEMT structures by DLTFS with optical excitation

M. Matúš, J. Drobný, A. Kosa, J. Marek, J. Kováč, L. Stuchlíková
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引用次数: 0

Abstract

This paper deals with identifying electrically active defects and determining their fundamental parameters in InAlGaN/GaN HEMT structures by Deep Level Transient Fourier Spectroscopy (DLTFS) with optical excitation. Parameters of 5 electron-like defects and three hole-like defects were confirmed by DLTFS method. Parameters of 9 hole-like defects common to both structures were identified by DLTFS-O. Two hole-like defects were confirmed by both methods: DLTFS and DLTFS-O methods. The probable origin of electron-like defects could be nitrogen vacancies, defect clusters along screw- and mixed-type dislocations, the presence of surface states or emissions from the interface. The probable origin of hole-like defects could be the presence of surface states or defects in barriers. The benefits of different method utilization were confirmed by experimental results.
光激发DLTFS法研究InAlGaN/GaN HEMT结构
本文研究了利用光激发的深能级瞬态傅立叶光谱(DLTFS)识别InAlGaN/GaN HEMT结构中的电活性缺陷并确定其基本参数。用DLTFS方法确定了5个类电子缺陷和3个类空穴缺陷的参数。采用DLTFS-O对两种结构共有的9个类孔缺陷进行了参数识别。DLTFS和DLTFS- o两种方法均证实了两个类孔缺陷。类电子缺陷的可能来源可能是氮空位、螺旋型和混合型位错的缺陷团簇、表面态的存在或界面的发射。类空穴缺陷的可能起源可能是表面状态或屏障缺陷的存在。实验结果证实了不同方法的应用效果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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