{"title":"A Portable Micro-Plasma Plume Source","authors":"S. Wang, X. Xu, C. Liu, L. Zhao","doi":"10.1109/PPPS.2007.4345624","DOIUrl":null,"url":null,"abstract":"Summary form only given. In this paper, we describe a special portable micro-plasma plume cleaning device. A specially designed plasma source, the micro-plasma plume, is operated under the atmospheric pressure with low power supply. The capacitively coupled configuration of the micro-plasma plume realizes the stable operation with major rare gases (He or Ar) and a small quantity of reactive gases (e.g. O2). The electrical properties and optical emission spectroscopy (OES) are used to characterize the discharge. The effects of frequency of the rf power supply on the electrical and spectral properties were studied. In addition, two relatively optimal gas flow arrangements for Ar and He discharges were obtained from the OES analysis respectively, which might be helpful in practical applications.","PeriodicalId":446230,"journal":{"name":"2007 IEEE 34th International Conference on Plasma Science (ICOPS)","volume":"80 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 IEEE 34th International Conference on Plasma Science (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPPS.2007.4345624","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Summary form only given. In this paper, we describe a special portable micro-plasma plume cleaning device. A specially designed plasma source, the micro-plasma plume, is operated under the atmospheric pressure with low power supply. The capacitively coupled configuration of the micro-plasma plume realizes the stable operation with major rare gases (He or Ar) and a small quantity of reactive gases (e.g. O2). The electrical properties and optical emission spectroscopy (OES) are used to characterize the discharge. The effects of frequency of the rf power supply on the electrical and spectral properties were studied. In addition, two relatively optimal gas flow arrangements for Ar and He discharges were obtained from the OES analysis respectively, which might be helpful in practical applications.