Fabrication Technology For Monolithic GaAs VFETs*

R. C. Clarke, M. Driver, T. O’Keeffe, R. A. Wickstrom
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引用次数: 1

Abstract

Monolithic gallium arsenide vertical FETs have been fabricated with a suspended gate, 0.7 /spl mu/m long, and a drain on top of a vertical pillar 4 /spl mu/m high and 0.3 /spl mu/m thick with a doping concentration of 2 x 10 /sup 17/ cm/sup -3/. VFET channels were combined with air bridges attached to bond pads situated on a semi-insulating substrate. A computer-generated VFET equivalent circuit based on s-parameters indicated a source-drain feedback capacitance of 0.008 pF at 240 /spl mu/m, which is an order of magnitude lower than has been observed in planar MESFETs, with an associated VFET output impedance of 1230 ohm at 240 /spl mu/m. Under RF test, VFETs yielded 11.3 dB maximum stable gain at 18 GHz with an F/sub t/ of 13 GHz and an extrapolated F /sub max/of 67 GHz.
单片砷化镓vfet的制备技术*
单片砷化镓垂直场效应管具有悬挂栅极,长0.7 /spl μ m,漏极位于垂直柱顶部,高4 /spl μ m,厚0.3 /spl μ m,掺杂浓度为2 × 10 /sup 17/ cm/sup -3/ sup。VFET通道与连接在半绝缘衬底上的键合垫上的气桥相结合。基于s参数的计算机生成的VFET等效电路显示,在240 /spl mu/m时,源漏反馈电容为0.008 pF,比平面mesfet低一个数量级,在240 /spl mu/m时,相关的VFET输出阻抗为1230欧姆。在RF测试中,vfet在18 GHz时产生11.3 dB的最大稳定增益,F/sub /为13 GHz,外推F/sub max/为67 GHz。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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