Study on Reliability of Low Noise GaAs MESFETs

T. Suzuki, M. Otsubo, T. Ishii, K. Shirahata
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引用次数: 2

Abstract

Analysis is made with regard to the failure mode of GaAs FETs and cause of the failure is investigated. It is fundamental for improving reliability of GaAs FETs to suppress the localized high electric field and the gate metal migration. The deep gate recess and the thick gate structure and the unsymmetric configuration of the gate location between source and drain are introduced. DC surge pulse capability and the RF input power capability of the improved GaAs FETs are 2 times and more than 5 times, respectively compared with conventional GaAs FETs.
低噪声GaAs mesfet的可靠性研究
分析了砷化镓场效应管的失效模式,探讨了失效的原因。抑制局域强电场和栅极金属迁移是提高GaAs场效应管可靠性的基础。介绍了深栅极凹槽和厚栅极结构以及源漏栅极位置的非对称配置。改进的GaAs fet的直流浪涌脉冲能力和射频输入功率能力分别是传统GaAs fet的2倍和5倍以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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