High power microwave measurement techniques at CEA-Gramat

A. Chauloux, J. Diot, N. Tharaud, Jérémy Pothée
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引用次数: 1

Abstract

High power microwave (HPM) measurement remains a challenging application since it requires accurate sensors with high power handling. Electromagnetic (EM) fields can reach dramatically high magnitudes such as MV per meter. If no particular attention is paid when designing a sensor for HPM measurements, electrical breakdowns may appear. This leads to irreversible damages and non-accurate results. Through the HPM developments achieved at CEA-Gramat various techniques have raised for the diagnostic of EM fields patterns and microwave power levels delivered by relativistic sources. Three are here introduced: EM field measurement with in-situ calibration; a waveguide integrated coupler to determine output powers of microwave sources; a photothermal film to observe the EM field.
CEA-Gramat的高功率微波测量技术
高功率微波(HPM)测量仍然是一个具有挑战性的应用,因为它需要具有高功率处理的精确传感器。电磁(EM)场可以达到非常高的量级,例如每米MV。如果在设计用于HPM测量的传感器时没有特别注意,可能会出现电气故障。这会导致不可逆的损害和不准确的结果。通过在CEA-Gramat取得的HPM发展,提出了用于诊断电磁场模式和相对论源提供的微波功率水平的各种技术。本文介绍了三种方法:原位校准电磁场测量;一种用于确定微波源输出功率的波导集成耦合器用光热薄膜来观察电磁场。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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