{"title":"Analytical analysis and modelling of variation in maximum frequency of oscillation of subthreshold MOSFET","authors":"R. Banchuin, R. Chaisricharoen","doi":"10.1109/JICTEE.2014.6804065","DOIUrl":null,"url":null,"abstract":"In this research, analytical analysis and modelling of statistical variations in maximum frequency of oscillation of subthreshold MOSFET, has been proposed with major imperfection in the physical level properties including random dopant fluctuation and effects of variations in MOSFET's manufacturing process, have been taken into account. The resulting model has been found to be analytical expressions in terms of physical level variables of MOSFET. Furthermore, it has been verified by using 65 nm level BSIM4 based benchmarks as highly accurate with smaller than 10% average percentages of errors. Hence, this research gives an efficient mathematical tool to the statistical and variability aware analysis and design of subthreshold MOSFET based RF circuits, systems and applications.","PeriodicalId":224049,"journal":{"name":"The 4th Joint International Conference on Information and Communication Technology, Electronic and Electrical Engineering (JICTEE)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The 4th Joint International Conference on Information and Communication Technology, Electronic and Electrical Engineering (JICTEE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/JICTEE.2014.6804065","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
In this research, analytical analysis and modelling of statistical variations in maximum frequency of oscillation of subthreshold MOSFET, has been proposed with major imperfection in the physical level properties including random dopant fluctuation and effects of variations in MOSFET's manufacturing process, have been taken into account. The resulting model has been found to be analytical expressions in terms of physical level variables of MOSFET. Furthermore, it has been verified by using 65 nm level BSIM4 based benchmarks as highly accurate with smaller than 10% average percentages of errors. Hence, this research gives an efficient mathematical tool to the statistical and variability aware analysis and design of subthreshold MOSFET based RF circuits, systems and applications.