Tantalum oxide nanoscale resistive switching devices: TEM/EELS study (Presentation Recording)

Kate J. Norris, Jiaming Zhang, E. Merced-Grafals, S. Musunuru, M. Zhang, K. Samuels, Jianhua Yang, N. Kobayashi
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引用次数: 1

Abstract

The field of non-volatile memory devices has been boosted by resistive switching, a reversible change in electrical resistance of a dielectric layer through the application of a voltage potential. Tantalum oxide being one of the leading candidates for the dielectric component of resistance switching devices was investigated in this study. 55nm TaOx devices in all states were compared through cross sectional TEM techniques including HRTEM, EELS, and EFTEM and will be discussed in this presentation. Based on the chemical and physical features found in the cross sectioned nanodevices we will discuss the switching mechanism of these nanoscale devices.
氧化钽纳米级电阻开关器件:TEM/EELS研究(演示记录)
非易失性存储器件领域已经被电阻开关所推动,电阻开关是通过施加电压电位而使介电层的电阻发生可逆变化。本文对氧化钽作为电阻开关器件中介电元件的主要候选材料之一进行了研究。通过横截面透射电镜技术(包括HRTEM、EELS和EFTEM)对所有状态下的55nm TaOx器件进行了比较,并将在本报告中进行讨论。基于所发现的纳米器件的化学和物理特征,我们将讨论这些纳米器件的开关机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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