Thermal Model of Miniaturized Schottky Emitter for Parallel Electron Beam Lithography

A. K. Dokania, J. Velthuis, Yanxia Zhang, P. Kruit
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引用次数: 5

Abstract

This paper investigates the possibility of creating an array of Schottky emitters for use in parallel electron beam lithography. The Schottky source consists of a tiny single crystal W wire spot-welded on a heating filament for heating up to 1800 K. By designing the dimensions of the heating filament and choosing the best material, current etc, the emitter is optimized in a such a way that the temperature at the tip could be at 1800 K, without raising the temperature in surroundings significantly. In the proposed array design, 200 Schottky emitters will be arranged within the dimension of 30 times 30 mm and each beam from a source is further split into 100 beamlets
平行电子束光刻小型化肖特基发射极的热模型
本文探讨了制造用于平行电子束光刻的肖特基发射体阵列的可能性。肖特基光源由一根微小的单晶钨丝点焊在加热丝上,加热到1800k。通过设计加热灯丝的尺寸和选择最佳材料、电流等,优化了发射极,使尖端温度达到1800 K,而不会显著提高周围温度。在所提出的阵列设计中,200个肖特基发射器将被布置在30 × 30 mm的尺寸内,并且来自一个源的每个波束进一步分成100个波束
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