A gray matching method for cylindrical lens array fabrication based on DMD lithography

Abstract

For the requirement of matching accuracy of cylindrical lens array based on DMD (digital micromirror device) maskless lithography, we study on exposure mode and the method of mask design, using a gray scale gradient method for mask optimization and eliminating the graph matching problems of truncation and dislocation. Before exposing, the area of overlap should be set up for the matching part of a mask, and the gray level is gradient in it. We design a matching mask based on the space modulation principle of grayscale mask of digital micromirror device, the experimental results show that: using this method to fabricate cylindrical lens array, the problem of truncation can be eliminated and the quality of exposure is improved.