Towards a Common Semantic Representation of Design and Cloud Patterns

Abstract

This paper describes a semantic based representation for Design Patterns, defined on the base of the formal pattern language known as ODOL, which has been corrected and extended to better represent both structural and behavioural aspects of pattern descriptions. In particular, new concepts have been added to the underlying OWL ontology to enrich the structural description of patterns, while OWL-S has been adopted to describe patterns' behaviour by representing participants' methods as services. Our goal is to define a new, flexible and easily extendible pattern representation, which could be used to describe all aspects of Design Patterns and could be also applied to cloud computing, in particular to the description of Cloud Patterns. We provide details on the defined language and considerations on its ability to describe both Design and Cloud Patterns.