Buried homojunction solar cells formed in p-InP during sputter deposition and hydrogen plasma processing

T. Gessert, X. Li, M. Wanlass, T. Coutts
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引用次数: 1

Abstract

Although it is apparent that direct current (DC) magnetron sputter deposition of indium tin oxide (ITO) leads to the formation of a buried homojunction in single-crystal p-type InP, the actual mechanism of type conversion of the InP surface is not clear. Since sputter deposition of In/sub 2/O/sub 3/ has also led to high-quality cells, it appears that Sn is not the cause of type conversion. To investigate the junction formation process further, experiments involving the use of a pure hydrogen plasma have been performed, resulting in type conversion of Fe-doped InP surfaces and in solar cells with efficiencies >16% (global). The results confirm that sputter deposition is not necesssary to form this type of buried homojunction solar cell, and they suggest a fabrication process that may be used with other relevant photovoltaic materials.<>
在p-InP溅射沉积和氢等离子体处理过程中形成埋藏的同质结太阳能电池
虽然直流磁控溅射沉积铟锡氧化物(ITO)导致单晶p型InP表面形成埋藏的同质结是显而易见的,但InP表面类型转换的实际机制尚不清楚。由于In/sub 2/O/sub 3/的溅射沉积也导致了高质量的电池,所以Sn似乎不是导致类型转换的原因。为了进一步研究结的形成过程,研究人员进行了使用纯氢等离子体的实验,从而实现了铁掺杂InP表面的类型转换,并在太阳能电池中实现了效率>16%(全球)。结果证实,溅射沉积并不是形成这种埋藏式同质结太阳能电池所必需的,他们提出了一种可以与其他相关光伏材料一起使用的制造工艺
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