Photoluminescence decay in porous silicon films

I. Baltog, M. Ciurea, G. Pavelescu, L. Mihut, M. Baibarac
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Abstract

The photoluminescence (PL) decay measurements were performed on porous silicon films. It was observed that the two components of PL, one of them fast (ns) and the other slow (microsecond(s) or ms sometimes) have different contributions to PL signal, depending on the wavelength of the excitation light. The slow component of PL was in details investigated. Time decay cures for different excitation (337.1 nm, 470 nm, and 550 nm) and emission (550, 650, 700, 800 and 860 nm) wavelengths and also for different excitation intensities were taken. All decay curves were fitted with a stretched exponential. The slow component of PL was proposed to be attributed to the radiative recombination on surfaces.
多孔硅薄膜的光致发光衰减
在多孔硅薄膜上进行了光致发光(PL)衰减测量。观察到,根据激发光的波长不同,PL的两个组成部分,其中一个是快的(ns),另一个是慢的(微秒),有时是ms)对PL信号的贡献不同。对PL的慢速组分进行了详细的研究。对不同激发波长(337.1 nm、470 nm和550 nm)和发射波长(550、650、700、800和860 nm)以及不同激发强度下的时间衰减曲线进行了计算。所有的衰减曲线都用拉伸指数拟合。PL的慢速成分被认为是表面上的辐射复合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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