{"title":"Horizontal gradient-freeze growth of InP crystals under controlled pressure","authors":"G. Iseler, H. Clark","doi":"10.1109/ICIPRM.1990.202981","DOIUrl":null,"url":null,"abstract":"The use of a horizontal gradient-freeze (HGF) method employing a sealed pressure-balanced system for synthesis and in situ crystal growth without encapsulation is described. The thermal stability of semi-insulating InP:Ti,Hg is discussed, and synthesis by conventional methods and by liquid-encapsulated Czochralski (LEC) growth is considered. Synthesis and HGF growth under controlled P pressure are then examined. Since the melt is not encapsulated, the P pressure can be adjusted to obtain the optimum melt composition for minimizing defect density, impurity contamination, and twinning. In addition, in situ growth prevents impurity contamination that can results when a growth charge synthesized in one system is transferred to a second system for crystal growth.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.202981","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
The use of a horizontal gradient-freeze (HGF) method employing a sealed pressure-balanced system for synthesis and in situ crystal growth without encapsulation is described. The thermal stability of semi-insulating InP:Ti,Hg is discussed, and synthesis by conventional methods and by liquid-encapsulated Czochralski (LEC) growth is considered. Synthesis and HGF growth under controlled P pressure are then examined. Since the melt is not encapsulated, the P pressure can be adjusted to obtain the optimum melt composition for minimizing defect density, impurity contamination, and twinning. In addition, in situ growth prevents impurity contamination that can results when a growth charge synthesized in one system is transferred to a second system for crystal growth.<>