Opto-electrical properties of amorphous carbon thin films deposited by Aerosol-Assisted Chemical Vapor Deposition

2012 IEEE Symposium on Humanities, Science and Engineering Research Pub Date : 2012-06-24 DOI:10.1109/SHUSER.2012.6268825

A. N. Fadzilah, K. Dayana, U. Noor, M. Rusop

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Abstract

Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage (I-V) characteristics using Solar Simulator system and the analysis stressed on the linear (ohmic) graph for the a-C thin films. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illuminations: 100 mW/cm2, 25°C). Optical characteristics was investigated by UV-Vis-NIR spectroscope and transmittance spectrum exhibit a large transmittance value (>;85%) and high absorption coefficient value (>;106 cm-1) at the visible range of 390 to 790 nm. For structural properties, Atomic Force Microscope was used for the characterization process to obtain a-C images at atomic level.

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气溶胶辅助化学气相沉积非晶碳薄膜的光电性能

采用气溶胶辅助气相沉积法(AACVD)制备了非晶碳(a-C)薄膜，并对其性能进行了研究。为了优化a-C薄膜的特性，研究了实验装置的流速(15、30、45和60个气泡/分钟)，并研究了a-C薄膜的电学、光学和结构特性。利用太阳模拟器系统对a-C薄膜的电学性能进行了电流-电压(I-V)特性表征，并着重分析了a-C薄膜的线性(欧姆)图。在照明(AM 1.5照明:100 mW/cm2, 25°C)时，沉积的a-C的光响应特性被突出显示。通过紫外-可见-近红外光谱对其光学特性进行了研究，在390 ~ 790 nm的可见光范围内，透射率值大(>;85%)，吸收系数值高(>;106 cm-1)。对于结构性质，使用原子力显微镜进行表征过程，获得原子水平的a-C图像。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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2012 IEEE Symposium on Humanities, Science and Engineering Research

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