Comparative analysis of various 9T SRAM cell at 22-nm technology node

Chandaramauleshwar Roy, A. Islam
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引用次数: 6

Abstract

This article presents a comparative analysis of various 9T SRAM cell at 22-nm technology node. Using Monte-Carlo simulations critical design metrics of various 9T SRAM cells are estimated. UV9T (ultralow voltage 9T SRAM cell) offers shortest read delay and DF9T (disturb-free 9T SRAM cell) exhibits longest read delay. SF9T (supply feedback 9T SRAM cell) offers shortest write delay and DFsub9T (disturb-free subthreshold 9T SRAM cell) shows longest write delay. SF9T consumes lower write power compared to other cells. RSNM (read static noise margin) of DF9T, DFsub9T and UV9T are same and equal to 230 mV as they are read decoupled. Although it is read decoupled, SF9T shows 2.19× lower RSNM due to supply gating. SF9T offers 1.70×, 1.68×, 1.21× higher WSNM compared to UV9T, DF9T and DFsub9T respectively. SF9T benefits from shorter write delay, lower write power consumption and higher WSNM at cost of lower RSNM. The designs offering lower read/write delay, write power, higher WSNM and RSNM are reported, to aid the designer in selecting the best cell depending on specific requirements.
不同9T SRAM电池在22nm工艺节点的比较分析
本文对不同的9T SRAM单元在22nm工艺节点上的性能进行了比较分析。利用蒙特卡罗模拟估计了各种9T SRAM单元的关键设计指标。UV9T(超低电压9T SRAM单元)具有最短的读取延迟,DF9T(无干扰9T SRAM单元)具有最长的读取延迟。SF9T(供应反馈9T SRAM单元)提供最短的写入延迟,DFsub9T(无干扰亚阈值9T SRAM单元)显示最长的写入延迟。与其他电池相比,SF9T消耗更低的写功率。DF9T、DFsub9T和UV9T的RSNM(读静态噪声裕度)相同,因为它们是读去耦的,等于230 mV。虽然它是读去耦的,但由于电源门控,SF9T的RSNM降低了2.19倍。SF9T的WSNM分别比UV9T、DF9T和DFsub9T高1.70倍、1.68倍和1.21倍。SF9T的优点是更短的写延迟、更低的写功耗和更高的WSNM,但代价是更低的RSNM。报告了具有更低读写延迟、写功率、更高WSNM和RSNM的设计,以帮助设计人员根据特定要求选择最佳单元。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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