In Operando Micro-Raman 3-D Thermometry with Diffraction-Limit Spatial Resolution for GaN-based (Opto)electronic Devices

Yong Zhang
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Abstract

Confocal micro-Raman microscopy performed in the transparent spectral region of a semiconductor can, in principle, be used for operando three-dimensional (3D) thermometry with optical diffraction-limit spatial resolution. However, when applied to high-power GaN-based light-emitting diodes (LEDs), the applicability is hindered by the secondary but nevertheless relatively strong electroluminescence in the visible spectral region that can overwhelm the Raman signal. We develop a “split-time-window” scheme that can mimic the continuous wave operation but without the interference of the secondary emission, which allows us to carry out noninvasive 3D temperature profiling and comprehensive thermal analyses of the whole device at any operation current. The technique is applied to an (InxGa1-x)N/GaN LED to extract its 3D temperature distribution when operated at 350 mA with μm-scale resolution when using a 532-nm laser. This technique allows for in-operando monitoring whether hot spots are associated with device failure. If further correlating with HRSTM investigation, one can obtain the structure information of the hot spots in the device and thus help to determine the device failure mechanism. The approach is equally applicable to other devices, such as power electronic devices.
基于氮化镓(Opto)电子器件的衍射极限空间分辨率微拉曼三维测温
在半导体的透明光谱区域进行的共聚焦微拉曼显微镜,原则上可以用于具有光学衍射极限空间分辨率的操作三维(3D)测温。然而,当应用于高功率氮化镓基发光二极管(led)时,其适用性受到可见光谱区域中二次但相对较强的电致发光的阻碍,该电致发光可以压倒拉曼信号。我们开发了一种“分裂时间窗口”方案,可以模拟连续波操作,但没有二次发射的干扰,这使我们能够在任何操作电流下对整个设备进行无创3D温度剖面和全面的热分析。将该技术应用于(InxGa1-x)N/GaN LED,在532 nm激光照射下,以μm级分辨率提取其在350 mA下的三维温度分布。该技术允许在操作中监测热点是否与设备故障相关。如果进一步与HRSTM调查相结合,可以获得设备中热点的结构信息,从而有助于确定设备的故障机制。该方法同样适用于其他设备,如电力电子设备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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