Field electron emission from metal surfaces irradiated with helium plasmas

D. Hwangbo, S. Kajita, N. Ohno, D. Sinelnikov
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引用次数: 4

Abstract

Field emission properties on several different metal surfaces irradiated with helium plasmas were measured. Field emission currents from nanostructure, pinhole, and loop-like tantalum surfaces were significantly higher than that from polished tantalum (Ta) surface. Before and after the micro-breakdown, where the current density was under ~1 μA/mm2, field enhancement factor showed slight increase. On the other hand, significant increase of field enhancement factor was measured after breakdown, where the current density increased up to ~100 μA/mm2. In the scanning electron microscope observation, melted cathode spots were detected. The increment of field enhancement factor after the breakdown may be induced by thermo-field electron emission from the melted spots.
氦等离子体辐照金属表面的场电子发射
测量了氦等离子体辐照几种不同金属表面的场发射特性。纳米结构、针孔和环状钽表面的场发射电流明显高于抛光钽(Ta)表面。微击穿前后,电流密度在~1 μA/mm2以下时,场增强因子略有增加。击穿后电场增强系数显著增加,电流密度可达~100 μA/mm2。在扫描电镜下观察到熔化的阴极斑点。击穿后场增强因子的增加可能是由熔化点的热场电子发射引起的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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