Thermal management of MOSFET junction temperature in RF amplifier

Z. Qi, Hua-jun Dong, Yahong Wang, J. Reif
{"title":"Thermal management of MOSFET junction temperature in RF amplifier","authors":"Z. Qi, Hua-jun Dong, Yahong Wang, J. Reif","doi":"10.1109/STHERM.2011.5767195","DOIUrl":null,"url":null,"abstract":"MOSFETs in an RF amplifier dissipate high heat flux due to switching and conduction loss. MOSFET's junction temperature affects product reliability adversely. This paper presents a thermal management method used in an RF amplifier development with junction to case temperature rise transient analysis, Thermal Interface Material (TIM) testing, clamping structural Finite Element Analysis (FEA), and Computational Fluid Dynamics (CFD) aided cold plate optimization. Using the systematic method presented in this paper, thermal management of MOSFET junction temperature can be implemented with clear insights of temperature budget consumption in each section, and optimization options.","PeriodicalId":128077,"journal":{"name":"2011 27th Annual IEEE Semiconductor Thermal Measurement and Management Symposium","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 27th Annual IEEE Semiconductor Thermal Measurement and Management Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/STHERM.2011.5767195","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

Abstract

MOSFETs in an RF amplifier dissipate high heat flux due to switching and conduction loss. MOSFET's junction temperature affects product reliability adversely. This paper presents a thermal management method used in an RF amplifier development with junction to case temperature rise transient analysis, Thermal Interface Material (TIM) testing, clamping structural Finite Element Analysis (FEA), and Computational Fluid Dynamics (CFD) aided cold plate optimization. Using the systematic method presented in this paper, thermal management of MOSFET junction temperature can be implemented with clear insights of temperature budget consumption in each section, and optimization options.
射频放大器中MOSFET结温的热管理
射频放大器中的mosfet由于开关和传导损耗而耗散高热流。MOSFET的结温对产品的可靠性有不利影响。本文介绍了一种用于射频放大器开发的热管理方法,该方法具有结壳温升瞬态分析、热界面材料(TIM)测试、夹紧结构有限元分析(FEA)和计算流体动力学(CFD)辅助冷板优化。使用本文提出的系统方法,可以通过清晰地了解每个部分的温度预算消耗和优化选项来实现MOSFET结温的热管理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信