Effect of buffer layer on the growth of GaN films on sapphire

Ke Xu, Rongsheng Qiu, J. Xu, Z. Fang, P. Deng, Xiaoshan Wu, Mu Wang, N. Ming
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Abstract

The influence of buffer layer on the growth of GaN epilayer was investigated. Five matching orientations were identified when GaN was directly grown on the sapphire (0001) plane. The use of low-temperature buffer layer significantly improved the epitaxial film quality and the surface morphology. The optimal thickness of buffer layer was about 18 nm - 20 nm in the present growth condition.
缓冲层对蓝宝石表面GaN膜生长的影响
研究了缓冲层对氮化镓薄膜生长的影响。当GaN直接生长在蓝宝石(0001)平面上时,确定了五个匹配的取向。低温缓冲层的使用显著改善了外延膜的质量和表面形貌。在目前的生长条件下,缓冲层的最佳厚度为18 ~ 20 nm。
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