Radiation damage of 1.0 mm CMOS VLSI as a function of latchup immunity

Y. Saitoh, T. Akiba, H. Konishi, H. Watanabe, K. Nonaka, M. Kamiya, T. Tsuboyama, T. Miura
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引用次数: 1

Abstract

The radiation damage of CMOS VLSI as a function of latchup immunity has been examined. Substantial effects of neutrons and electrons on I/sub L/ (latchup current) have been found. There is an increase of I/sub L/ with neutron and electron dosage. A nonnegligible restoration was observed after subsequent annealing. The increase of I/sub L/ was found to be caused by degradation of I/sub C/ (h/sub FE/). The degradation of I/sub c/ was observed as a function of base width. The degradation of I/sub c/ was absorbed principally by volume recombination rather than surface recombination. There is no problem with the latchup immunity of CMOS VLSI due to irradiation. From the manufacturer's point of view, this result suggests a way of improving latchup immunity for advanced CMOS VLSIs.<>
1.0 mm CMOS VLSI的辐射损伤与闭锁抗扰度的关系
研究了CMOS VLSI的辐射损伤与闭锁抗扰度的关系。发现了中子和电子对闭锁电流I/sub / L/的实质性影响。I/sub / L随中子和电子剂量的增加而增加。在随后的退火后观察到不可忽略的恢复。I/sub L/的增加是由I/sub C/ (h/sub FE/)的降低引起的。I/sub / c/的衰减随碱基宽度的变化而变化。I/sub / c/的降解主要通过体积复合而不是表面复合来吸收。CMOS超大规模集成电路不存在因辐照引起的闭锁抗扰度问题。从制造商的角度来看,这一结果为提高先进CMOS vlsi的闭锁抗扰度提供了一条途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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