Mobility issues in double-gate SOI MOSFETs: Characterization and analysis

Noel Rodriguez, Sorin Cristoloveanu, L. P. Nguyen, F. Gámiz
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引用次数: 5

Abstract

The carrier mobility in ultra-thin SOI transistors was measured at the front channel, back channel and in double gate mode (DG). A model for generalizing the mobility extraction method, based on the F-function, is proposed. In DG-mode the apparent mobility is the sum of front and back channel mobilities only if the two channels are independent (partially depleted or relatively thick fully depleted MOSFETs). In ultrathin transistors, the coupling effect should be accounted for achieving a balanced DG-mode. An outstanding apparent mobility enhancement in DG-mode is measured which cannot be explained by a 2-channels model. This result gives clear evidence of the benefit of volume inversion.
双栅SOI mosfet的迁移率问题:表征与分析
测量了超薄SOI晶体管在前通道、后通道和双栅极模式下的载流子迁移率。提出了一种基于f函数的迁移率提取方法的推广模型。在dg模式下,只有当两个通道是独立的(部分耗尽或相对厚的完全耗尽mosfet)时,表观迁移率是前沟道和后沟道迁移率的总和。在超薄晶体管中,为了实现平衡的dg模式,必须考虑耦合效应。在dg模式下,测量到明显的迁移率增强,这不能用双通道模型来解释。这一结果清楚地证明了体积反演的好处。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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