Anodic dissolution of InP

Abstract

An experimental study was conducted in order to select a suitable electrolytic solution and to optimize the anodic dissolution process of InP surface so as to be able to control the thinning of heavily doped surface layers of n/sup +/-p or p/sup +/-n InP structures. Several electrolytic solutions based on HCl, H/sub 3/PO/sub 4/, H/sub 2/SO/sub 4/, HF, CH/sub 3/COOH and H/sub 2/O/sub 2/ were investigated. From the analysis of electrochemical C-V, and I-V characteristics at different DC bias voltages and illumination levels and from scanning electron microscope inspection, it was determined that HF:CH/sub 3/COOH:H/sub 2/O/sub 2/:H/sub 2/O solution is a good candidate for rendering smooth surfaces, free of contamination and with good electrical characteristics, by anodic dissolution of n/sup +/- or p/sup +/-InP front surfaces.<>