2D Nano Materials for CMOS compatible Gas Sensors

R. Jha, N. Sakhuja, N. Bhat
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引用次数: 1

Abstract

Among the 2D materials family, the Transition Metal Dichalcogenides (TMD) offer interesting opportunities for application in chemi-resistive gas sensors. Along with high surface to volume ratio, an ideal characteristic for surface adsorption driven gas sensing phenomenon, TMDs lend themselves for wide range of tunability of other important parameters such as bandgap and conductivity. In order to build CMOS compatible gas sensors for system-on-chip applications, it is also important to develop low temperature processes for the integration of sensing materials at the back end of the CMOS line. In this context liquid exfoliation of 2D TMD materials can be exploited for room temperature synthesis of sensing material on top of CMOS platform. We present high performance gas sensors realized using few layer WS2 and MoSe22 for NH3 and H2S gases respectively.
用于CMOS兼容气体传感器的二维纳米材料
在二维材料家族中,过渡金属二硫族化合物(TMD)为化学电阻气体传感器的应用提供了有趣的机会。除了具有高表面体积比(表面吸附驱动的气体传感现象的理想特性)外,TMDs还具有其他重要参数(如带隙和电导率)的大范围可调性。为了构建兼容CMOS的片上系统气体传感器,在CMOS线的后端开发集成传感材料的低温工艺也很重要。在这种情况下,二维TMD材料的液体剥离可以用于CMOS平台上的室温合成传感材料。本文提出了一种基于WS2和MoSe22的高性能气体传感器,分别用于NH3和H2S气体。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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