A. Holovatyy, V. Teslyuk, M. Lobur, M. Szermer, C. Maj
{"title":"Mask Layout design of single- and double-arm electrothermal microactuators","authors":"A. Holovatyy, V. Teslyuk, M. Lobur, M. Szermer, C. Maj","doi":"10.1109/MEMSTECH.2016.7507513","DOIUrl":null,"url":null,"abstract":"In this paper, the mask layouts of the single- and double-arm electrothermal microactutors have been designed using the CleWin layout editor. The designed masks will be used for the development of training materials for a course on MEMS fabrication within the framework of the EduMEMS project.","PeriodicalId":102420,"journal":{"name":"2016 XII International Conference on Perspective Technologies and Methods in MEMS Design (MEMSTECH)","volume":"733 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 XII International Conference on Perspective Technologies and Methods in MEMS Design (MEMSTECH)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSTECH.2016.7507513","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
In this paper, the mask layouts of the single- and double-arm electrothermal microactutors have been designed using the CleWin layout editor. The designed masks will be used for the development of training materials for a course on MEMS fabrication within the framework of the EduMEMS project.