Electrostatic field distribution measurement using silicon micro-mirror array

T. Kuriyama, T. Aoi, W. Takatsuji, H. Maeda, T. Itoh, Y. Ueno, T. Nakaie, J. Matsui, Y. Miyamoto
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Abstract

Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.
用硅微镜阵列测量静电场分布
介绍了利用微机电系统(MEMS)工艺制造的硅微镜阵列测量静电场分布的方法。利用二维光学扫描仪和位置敏感探测器(PSD)测量了每个微镜在静电场作用下的偏转。得到的静电数据符合库仑定律,并将该系统应用于人体模型。
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