High-current pulse sources of broad gaseous and metallic ion beams for surface treatment applications

N. Gavrilov, S.P. Nikulin, E. Oks, P.M. Schanin
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Abstract

The paper reviews the experimental study and development of technological ion sources performed under a joint IEP-IHCE program for recent years. The sources are based on pulsed high-current glow and arc discharges and are designed for surface treatment applications. The use of cold cathodes makes the sources more reliable when operated under elevated residual gas pressure and at the presence of reactive gases, while the use of a repetitive pulse mode of plasma production provides optimum conditions for stable operation of the discharge, for controlling the average beam current over a wide range, and for formation of homogeneous broad ion beams. The electrode systems used in the ion sources provide for operation of high-current discharges at low pressures, production of stable, dense, and homogeneous plasmas, and decrease the impurities content in the beam. Some design versions of the sources developed are presented that are capable of producing /spl sim/1-10 mA/cm/sup 2/ of current density in beams with a cross section of some hundreds of square centimeters at accelerating voltages of 10-100 kV, pulse durations of 10-10/sup 3/ /spl mu/s, and pulse repetition rates of 1-500 Hz. Some applications of the sources for surface modification of materials are described.
用于表面处理应用的宽气体和金属离子束的大电流脉冲源
本文综述了近年来在IEP-IHCE联合项目下进行的技术离子源的实验研究和发展。这些光源基于脉冲大电流辉光和电弧放电,专为表面处理应用而设计。冷阴极的使用使源在高残余气体压力和反应气体存在下工作时更加可靠,而使用重复脉冲等离子体生产模式为放电的稳定运行提供了最佳条件,用于控制大范围内的平均束流,并形成均匀的宽离子束。离子源中使用的电极系统提供了在低压下进行大电流放电的操作,产生稳定、致密和均匀的等离子体,并减少了光束中的杂质含量。在加速电压为10-100千伏,脉冲持续时间为10-10/sup 3/ /spl mu/s,脉冲重复率为1-500 Hz的情况下,所开发的一些源设计版本能够在横截面约为数百平方厘米的光束中产生/spl sim/1-10 mA/cm/sup 2/ /的电流密度。介绍了这些源在材料表面改性中的一些应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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