2D R-Z Simulations for SPHINX Experiments - Numerical Study of Axial Inhomogeneities in the Ablation Process of Wire Arrays

J. Grunenwald, F. Hamann, H. Calamy
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Abstract

Summary form only given. On shot #543 the SPHINX machine based on microsecond LTD technology was used to implode a nested tungsten wire array with 140-74 mm outer-inner diameters, 144-90 (outer-inner) 4 mum W wires and 5 cm height. The maximum current was 4.2 MA and the implosion time (time of maximum of first X-ray peak) was 783 ns. An axial inhomogeneity of the implosion occurs in this shot and impacts the radiation output. Shot #543 was interesting because visible 2D images clearly show the formation of a precursor pinch growing from the anode to the cathode, creating a big upper bubble. This effect is seen on many shots even with aluminum wires but is less impressive that the one observed on shot #543. In this presentation we try to explain this phenomenon by a continuous variation of wire ablation velocity from the anode to the cathode (Vabl=Vabl(z)) using the model" that links the mass rate and the inverse of Vabl(z). As a consequence, if Vabl(anode) is higher, the precursor pinch will appear first near the anode and then will grow from bottom to top and if Vabl(cathode) is lower, the wire ablation will end sooner so the implosion will start sooner as well. Numerical simulations of this shot presented here was done with Marple2D (Fortran version), a 2D(r,z) MHD code developed by IMM (Moscow). These MHD simulations allow us to quantify possible variations of Vabl(z) in order to fit experimental results. 2D simulations are shown, a relation between Vabl and the physical velocity of the plasma front is given and the implementation in this code of the mass injection law is explained. The link between Er(z) (radial electric field) and Vabl(z) and the issue of simulating in the proper way the interaction between the precursor plasma and the inner array are also discussed.
SPHINX实验的二维R-Z模拟-导线阵列烧蚀过程中轴向不均匀性的数值研究
只提供摘要形式。在第543次射击中,使用基于微秒有限公司技术的SPHINX机器内爆了一个嵌套钨丝阵列,其外径为140-74毫米,外径为144-90(内外径)4微米钨丝,高度为5厘米。最大电流为4.2 MA,内爆时间(第一个x射线峰峰值时间)为783 ns。内爆发生轴向不均匀性,影响辐射输出。镜头#543很有趣,因为可见的2D图像清楚地显示了从阳极到阴极生长的前驱体捏缩的形成,产生了一个大的上部气泡。这种效果在很多镜头上都可以看到,即使是用铝线,但没有在543号镜头上观察到的那么令人印象深刻。在本演示中,我们试图通过从阳极到阴极(Vabl=Vabl(z))的导线烧蚀速度的连续变化来解释这一现象,使用连接质量率和Vabl(z)逆的模型。因此,如果Vabl(阳极)较高,前驱体夹尖将首先出现在阳极附近,然后从底部到顶部生长,如果Vabl(阴极)较低,导线烧蚀将更快结束,因此内爆也将更快开始。这个镜头的数值模拟是用Marple2D (Fortran版本)完成的,这是一个由IMM (Moscow)开发的2D(r,z) MHD代码。这些MHD模拟使我们能够量化Vabl(z)的可能变化,以拟合实验结果。给出了二维模拟,给出了Vabl与等离子体锋面物理速度的关系,并解释了质量注入定律在该代码中的实现。讨论了径向电场与径向电场之间的关系,以及前驱体与内阵列相互作用的合理模拟问题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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