Cortical recording with silicon microelectrodes: model-based analysis of contact dimension and encapsulation changes on recorded waveforms

M. Moffitt, C. McIntyre
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引用次数: 1

Abstract

Brain machine interfaces represent an emerging area of neurotechnology with both basic science and clinical applications. We developed a model of intracortical microelectrode recording to address the role of contact dimensions, tissue encapsulation, and neuron position on the time course and amplitude of the voltage records. We used a multi-compartment cable model of a 3D reconstruction of a layer V cortical pyramidal neuron to determine transmembrane currents generated during action potential signaling. We coupled the neuron model to finite element models (FEM) of microelectrodes in a cortical tissue medium. The neuronal currents were applied to the FEM and the voltage record at the contact was determined as a function of time. Our results show that the recorded waveform is relatively independent of typical contact sizes (<1000 mum2), but local inhomogeneities in the tissue medium can substantially enhance or suppress signal amplitude. Extensions of these analyses will enable development of silicon-substrate electrodes with optimized contact shape and distribution to achieve specific recording objectives
用硅微电极进行皮层记录:基于模型的接触尺寸分析和记录波形上的封装变化
脑机接口是神经技术的一个新兴领域,具有基础科学和临床应用。我们开发了一个皮质内微电极记录模型,以解决接触尺寸,组织封装和神经元位置对电压记录的时间过程和振幅的作用。我们使用了V层皮质锥体神经元三维重建的多室电缆模型来确定动作电位信号传导过程中产生的跨膜电流。我们将神经元模型与皮层组织介质中微电极的有限元模型(FEM)相结合。将神经元电流施加到FEM中,确定了接触点电压记录作为时间的函数。我们的研究结果表明,记录的波形相对独立于典型的接触尺寸(<1000 mum2),但组织介质中的局部不均匀性可以显著增强或抑制信号幅度。这些分析的扩展将能够开发具有优化接触形状和分布的硅衬底电极,以实现特定的记录目标
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