Addressable failure site test structures (AFS-TS) for process development and optimization

K. Doong, S. Hsieh, Sheng-che Lin, Binson Shen, Wang Chien-Jung, Yen-Hen Ho, J.Y. Cheng, Yeu-Haw Yang, K. Miyamoto, C. Hsu
{"title":"Addressable failure site test structures (AFS-TS) for process development and optimization","authors":"K. Doong, S. Hsieh, Sheng-che Lin, Binson Shen, Wang Chien-Jung, Yen-Hen Ho, J.Y. Cheng, Yeu-Haw Yang, K. Miyamoto, C. Hsu","doi":"10.1109/ICMTS.2000.844404","DOIUrl":null,"url":null,"abstract":"Two types of addressable failure site test structures are developed. In-house program is coded to extract the electrical information and simulate the failure mode. A complete set of test structure modules for 0.25 um logic backend of line process is implemented in a test chip of 22/spl times/6.6 mm/sup 2/. By using the novel test structure, the yield analysis and defect tracking of BEOL process development as well as low-k Fluorinated SiO/sub 2/ (FSG) process optimization are demonstrated.","PeriodicalId":447680,"journal":{"name":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2000.844404","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Two types of addressable failure site test structures are developed. In-house program is coded to extract the electrical information and simulate the failure mode. A complete set of test structure modules for 0.25 um logic backend of line process is implemented in a test chip of 22/spl times/6.6 mm/sup 2/. By using the novel test structure, the yield analysis and defect tracking of BEOL process development as well as low-k Fluorinated SiO/sub 2/ (FSG) process optimization are demonstrated.
可寻址故障现场测试结构(AFS-TS)用于工艺开发和优化
开发了两种可寻址故障点试验结构。编写内部程序,提取电气信息,模拟故障模式。在22/spl次/6.6 mm/sup /的测试芯片上实现了一套完整的0.25 um线制程逻辑后端测试结构模块。利用该新型测试结构,论证了BEOL工艺开发的良率分析和缺陷跟踪,以及低钾氟化SiO/sub 2/ (FSG)工艺优化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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