Comparative study of single Material gate and Dual Material gate Silicon-On-Insulator Junctionless Transistors

S. C. Wagaj, Y. Chavan
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引用次数: 2

Abstract

A Dual material gate silicon on Insulator Junctionless Transistor (DMG SOI JLT) is proposed in this paper. It's characteristics is demonstrated & compared with a single Material gate Silicon On Insulator Junctionless Transistor (SMG SOI JLT) using EDA tools used for simulation. The result shows that the DMG-SOI JLT has current driving capability higher than the single Material gate silicon on Insulator junctionless Transistor. The potential distribution of DMG SOI JLT has an abrupt change the transition of two gates and enhances the electric field in the channel. The channel length decrease then DIBL and sub threshold slope variation is minimum in DMG SOI JLT compare to SMG SOI JLT. Transconductance of SMG SOI JLT is observed 0.25mS for channel length 20nm.
单材料栅极与双材料栅极绝缘体上硅无结晶体管的比较研究
提出了一种双材料栅极硅绝缘体无结晶体管(DMG SOI JLT)。利用EDA工具进行仿真,演示了其特性并与单材料栅极绝缘体上硅无结晶体管(SMG SOI JLT)进行了比较。结果表明,DMG-SOI JLT具有比绝缘体无结晶体管单材料栅极硅更高的电流驱动能力。DMG SOI JLT的电势分布具有两个栅极跃迁的突变,增强了通道内的电场。与SMG SOI JLT相比,DMG SOI JLT河道长度减小,DIBL和亚阈值坡度变化最小。当通道长度为20nm时,SMG SOI JLT的跨导率为0.25mS。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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