{"title":"A method of interferogram interpretation.","authors":"G. Pinto, G. Vietri","doi":"10.1364/oft.1985.thcc4","DOIUrl":null,"url":null,"abstract":"A method for evaluating the performance of an optical system has been developed. The method is based on a comparison between the actual wavefront as measured at the output of the optical system under test and a simulated wavefront corresponding to the nominal system. In this way information regarding fabrication related defects can be obtained, in other words the difference in performance between the actual system and the nominal system corresponding to the design prescription can be appraised.","PeriodicalId":142307,"journal":{"name":"Optical Fabrication and Testing Workshop","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Fabrication and Testing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/oft.1985.thcc4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A method for evaluating the performance of an optical system has been developed. The method is based on a comparison between the actual wavefront as measured at the output of the optical system under test and a simulated wavefront corresponding to the nominal system. In this way information regarding fabrication related defects can be obtained, in other words the difference in performance between the actual system and the nominal system corresponding to the design prescription can be appraised.