Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

I. Rousseau, Irene Sánchez Arribas, J. Carlin, R. Butté, N. Grandjean
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Abstract

We report a numerical and experimental investigation of fabrication tolerances and outcoupling in optically pumped III-nitride nanolasers operating near λ = 460 nm, in which feedback is provided by a one-dimensional photonic crystal nanobeam cavity and gain is supplied by a single InGaN/GaN quantum well. Using this platform, we and others previously demonstrated single-μW lasing thresholds due to the high βQ-product inherent to the nanobeam geometry (β is spontaneous emission coupling fraction into desired mode). In this work, we improved the fraction of emission emitted into our microscope's light cone by combining a redesigned photonic crystal cavity (c.f. [3]) with a cross-grating coupler with period approximately twice the photonic crystal lattice constant. The samples were fabricated in epitaxial III-nitride layers grown on (111) silicon substrates using metal organic vapor phase epitaxy. The photonic crystal and output couplers were patterned using a single electron beam lithography exposure and subsequently transferred to the underlying III-nitride layers using dry etching. The nanobeams were then suspended via vapor phase etching of silicon in XeF2. Scanning electron microscopy cross-sections revealed high-aspect ratio (>5), sub-70 nanometer diameter holes with near-vertical sidewalls. Fabrication-induced geometry errors were characterized by processing scanning electron micrographs with custom critical dimension software. Using UV micro-photoluminescence spectroscopy at room temperature, we measured the nanobeams' emission intensity, far-field profile, and quality factor. By comparing more than ten nominally identical nanobeams for each geometry with finite-difference time-domain simulations taking into account the geometrical deviations measured during fabrication, we characterized the role of fabrication-induced imperfections. Finally, we explored the trade-off between the quality factor and collected signal via lithographic variations of the output coupler grating amplitude. Our results demonstrate the robustness of III-nitrides for short-wavelength photonic crystal applications, such as photonic integrated circuits, optoelectronics, and cavity quantum electrodynamics.
iii -氮化物光子晶体纳米束激光器的制造缺陷和光栅耦合器(会议报告)
本文报道了在λ = 460 nm附近工作的光泵浦iii -氮化物纳米激光器的制造公差和耦合的数值和实验研究,其中反馈由一维光子晶体纳米束腔提供,增益由单个InGaN/GaN量子阱提供。利用这个平台,我们和其他人先前证明了单μ w的激光阈值,这是由于纳米束几何形状固有的高β q积(β是自发发射耦合到期望模式的分数)。在这项工作中,我们通过将重新设计的光子晶体腔(c.f.[3])与周期约为光子晶格常数两倍的交叉光栅耦合器相结合,提高了发射到显微镜光锥的发射分数。样品采用金属有机气相外延技术在(111)硅衬底上生长的外延iii -氮化物层中制备。光子晶体和输出耦合器使用单电子束光刻曝光进行图像化,随后使用干蚀刻将其转移到底层的iii -氮化物层。然后通过气相蚀刻硅在XeF2中悬浮纳米梁。扫描电镜显示高纵横比(bbb50),直径在70纳米以下,侧壁接近垂直。利用自定义临界尺寸软件对扫描电子显微图进行处理,表征了制造引起的几何误差。利用室温下的紫外微光致发光光谱技术,测量了纳米光束的发射强度、远场分布和品质因子。考虑到制造过程中测量的几何偏差,通过比较每种几何形状的十多个名义上相同的纳米梁,并进行时域有限差分模拟,我们表征了制造诱导缺陷的作用。最后,我们通过输出耦合器光栅幅值的光刻变化探讨了质量因子与采集信号之间的权衡。我们的研究结果证明了iii -氮化物在短波光子晶体应用中的鲁棒性,例如光子集成电路,光电子学和腔量子电动力学。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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