Analog/RF figures of merit of advanced DG MOSFETs

R. K. Sharma, A. Antonopoulos, N. Mavredakis, M. Bucher
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引用次数: 10

Abstract

Analog/RF performance of gate stack dual material double gate (GSDMDG) and graded channel gate stack double gate (GCGSDG) has been examined by ATLAS device simulation, including quantum confinement. We propose two new analog/RF figures of merit, 1) gain frequency product (GFP) which combines both low- and high-frequency aspects of device operation, 2) gain transconductance frequency product (GTFP) that includes both the switching speed and intrinsic gain of the device and is very useful for circuit design. The GCGSDG shows higher transconductance frequency product (TFP) and is a good candidate for high speed switching applications. However, GSDMDG outperforms other devices in terms of GTFP.
先进DG mosfet的模拟/射频性能图
通过ATLAS器件仿真,包括量子约束,研究了栅极叠加双材料栅极(GSDMDG)和梯度通道栅极叠加双栅极(GCGSDG)的模拟/射频性能。我们提出了两个新的模拟/射频数字,1)增益频率积(GFP),它结合了器件工作的低频和高频方面,2)增益跨导频率积(GTFP),包括器件的开关速度和固有增益,对电路设计非常有用。GCGSDG具有较高的跨导频率积(TFP),是高速开关应用的良好候选者。然而,GSDMDG在GTFP方面优于其他设备。
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