Multiferroic Double-layer BiFeO3-CoFe2O4 Composite Films Prepared by Pulsed-Laser Deposition

Yanyan Zhu, Jinrong Cheng, Shengwen Yu, Wenbiao Wu, Z. Meng
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引用次数: 0

Abstract

Multiferroic BiFeO3-CoFe2O4 (BFO-CFO) double-layer thin film has been deposited on platinized silicon substrate by pulsed-laser deposition. The BFO and CFO thin layers are deposited at 450 and 600 degC respectively. The diffraction peaks from spinel CoFe2O4 phases can be observed from the x-ray diffraction patterns of the double-layer BFO-CFO films. Dielectric constant and loss of the BFO-CFO films are of around 60 and 0.06 respectively, changing little with increasing the frequency. The leakege current density is about 10-6 A/cm2 under the field of 100 kV/cm. BFO-CFO thin films exhibit good ferromagnetic properties with the saturation magnetization of 120 emu/cm3 .
脉冲激光沉积制备多铁双层BiFeO3-CoFe2O4复合薄膜
采用脉冲激光沉积技术在镀铂硅衬底上沉积了多铁BiFeO3-CoFe2O4 (BFO-CFO)双层薄膜。BFO和CFO薄层沉积温度分别为450℃和600℃。从BFO-CFO双层膜的x射线衍射图中可以观察到尖晶石CoFe2O4相的衍射峰。BFO-CFO膜的介电常数和损耗分别在60和0.06左右,随频率的增加变化不大。在100kv /cm场强下,漏电流密度约为10-6 A/cm2。BFO-CFO薄膜具有良好的铁磁性能,饱和磁化强度为120 emu/cm3。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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