Influence of Pre-Sputtering Technique on Material Properties of BST Thin Films for Tunable Microwave Applications

F. W. Jamaluddin, M. Khalid, A. Zoolfakar, M. H. Mamat, N. F. Mohd Nasir
{"title":"Influence of Pre-Sputtering Technique on Material Properties of BST Thin Films for Tunable Microwave Applications","authors":"F. W. Jamaluddin, M. Khalid, A. Zoolfakar, M. H. Mamat, N. F. Mohd Nasir","doi":"10.1109/RFM50841.2020.9344774","DOIUrl":null,"url":null,"abstract":"This paper focuses on the influence of pre-sputtering process on the material properties of RF sputtered Barium Strontium Titanate (BST) thin films. Ba0.5Sr0.5TiO3 thin films were synthesized on sapphire substrates via RF magnetron sputtering system for 2-, 3- and 4-hour deposition time. The samples were then post-annealed for 2 hours at 900 °C in conventional furnace and characterized using x-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron (FESEM) and energy dispersive x-ray (EDX). The AFM analysis revealed that the BST thin film of the 4-hour deposition time produces rougher surface due to larger grain size. All the XRD patterns observed to have intense (110) peaks, indicating the preferred orientation of the BST thin films. From the FESEM results, it is observed that the 3-hour deposited sample is denser and uniform compared to its 2-hour counterpart. However, the 4-hour deposited sample shows a non-uniform film. EDX analysis showed that the elemental composition of the 4-hour deposited sample is the closest to the ideal atomic concentration (at. %) of the BST thin film.","PeriodicalId":138339,"journal":{"name":"2020 IEEE International RF and Microwave Conference (RFM)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International RF and Microwave Conference (RFM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RFM50841.2020.9344774","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

This paper focuses on the influence of pre-sputtering process on the material properties of RF sputtered Barium Strontium Titanate (BST) thin films. Ba0.5Sr0.5TiO3 thin films were synthesized on sapphire substrates via RF magnetron sputtering system for 2-, 3- and 4-hour deposition time. The samples were then post-annealed for 2 hours at 900 °C in conventional furnace and characterized using x-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron (FESEM) and energy dispersive x-ray (EDX). The AFM analysis revealed that the BST thin film of the 4-hour deposition time produces rougher surface due to larger grain size. All the XRD patterns observed to have intense (110) peaks, indicating the preferred orientation of the BST thin films. From the FESEM results, it is observed that the 3-hour deposited sample is denser and uniform compared to its 2-hour counterpart. However, the 4-hour deposited sample shows a non-uniform film. EDX analysis showed that the elemental composition of the 4-hour deposited sample is the closest to the ideal atomic concentration (at. %) of the BST thin film.
预溅射技术对可调微波BST薄膜材料性能的影响
研究了预溅射工艺对射频溅射钛酸锶钡(BST)薄膜材料性能的影响。采用射频磁控溅射系统在蓝宝石衬底上制备了Ba0.5Sr0.5TiO3薄膜,沉积时间分别为2、3和4小时。然后在900°C的常规炉中退火2小时,使用x射线衍射(XRD)、原子力显微镜(AFM)、场发射扫描电子(FESEM)和能量色散x射线(EDX)对样品进行表征。AFM分析表明,沉积时间为4小时的BST薄膜由于晶粒尺寸较大,表面粗糙度较大。所有的XRD谱图都有很强的(110)峰,表明BST薄膜的择优取向。从FESEM结果可以观察到,3小时沉积的样品比2小时沉积的样品更致密和均匀。然而,沉积4小时的样品显示出不均匀的薄膜。EDX分析表明,4小时沉积样品的元素组成最接近理想原子浓度(at。%)的BST薄膜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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