Effect of Electroless Nickel Deposition on the Breakdown Voltage of Nanoporous Aluminium Oxide

Abstract

Anodic aluminium oxide films were formed in various acidic solutions and further covered by Ni and Cu coatings. Certain of them were reanodized to thicken their barrier sub-layer. As a final outcome, printed circuit boardlike multi-layer structure Al/Al$_{2}O_{3}$/Ni/Cu is produced. In this case, it is clearly demonstrated that the breakdown voltage of anodic oxide depends on its overall thickness, barrier sub-layer thickness, metal coating availability as well as to some extent on pore diameter.