Transitions Between Amorphous and Crystalline States Using Electrical Pulse in Tellurium-Based Semiconductor

T. Chakraborty
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Abstract

The phase transitions between amorphous and crystalline states by applying electrical pulses in tellurium-based semiconductor at room temperature has been studied in this paper. The memory device was fabricated by a semiconductor thin film of composition GelO Te90 sandwiched between two metal electrodes. Binary states ‘0’ and ‘1’ may be assigned to the high resistive amorphous state and the low resistive crystalline state, respectively. High-speed write and erase operations in the memory device were induced by applying short and long electrical pulses. It was found that for the given write and erase conditions, about 3500 write-erase cycles were attained by the application of electrical pulses. It is observed that the write and erase operations can not be performed for the given write and erase pulses after 3500 number of cycles. The resistivity drop of the amorphous state of the memory device after a number of write-erase cycles is also discussed in this paper.
利用电脉冲在碲基半导体中实现非晶态和晶态的转换
本文研究了电脉冲作用下碲基半导体在室温下的非晶态和晶态相变。该存储装置是由夹在两个金属电极之间的GelO Te90组成的半导体薄膜制成的。二元态“0”和“1”可分别指定为高阻非晶态和低阻晶态。高速写入和擦除操作是通过施加短脉冲和长脉冲来实现的。结果表明,在给定的写入和擦除条件下,使用电脉冲可实现约3500个写入擦除周期。观察到,对于给定的写和擦除脉冲,在3500个周期后不能执行写和擦除操作。本文还讨论了在多次擦写循环后存储器非晶态电阻率的下降。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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