Three-dimensional photonic crystals developed by double-angled reactive-ion etching technique

K. Suzuki, S. Takahashi, M. Okano, M. Imada, K. Ishizaki, T. Nakamori, Y. Ota, S. Noda
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Abstract

Three-dimensional photonic crystals are successfully fabricated by a double-angled deep-etching technique. Furthermore, bonding a light emitter onto or between three-dimensional crystals has been shown to enhance or suppress emission.
采用双角反应离子刻蚀技术制备三维光子晶体
利用双角度深度刻蚀技术成功制备了三维光子晶体。此外,在三维晶体上或三维晶体之间结合光发射器已被证明可以增强或抑制发射。
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