Characterisation Of Electroplated Eutectic Sn-Ag Solder

Z. Zhong, K. Chan, Y. H. Chen
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引用次数: 2

Abstract

This paper discusses the effects of electro-deposition processing conditions on the film composition and surface morphology. The rate of Ag deposition onto the bump depends on various processing parameters like current density, agitation and temperature. Among these parameters, the Ag content in the bump was found to be most sesitive to current plating density. At various Ag content, the morphology of the deposited solder was found to be different. This is due to the different types of drain growth at different Ag content. A high content bump was found with a needle-like Ag3Sn structure. This strcuture is believed to be the cause for the reduction in shear strength.
电镀共晶Sn-Ag焊料的表征
讨论了电沉积工艺条件对薄膜组成和表面形貌的影响。银沉积在凸包上的速率取决于各种工艺参数,如电流密度、搅拌和温度。在这些参数中,凸包中的Ag含量对电流密度最敏感。在不同的银含量下,沉积焊料的形貌是不同的。这是由于在不同的银含量下,漏极生长的类型不同。发现一个高含量的凸起,呈针状Ag3Sn结构。这种结构被认为是导致抗剪强度降低的原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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