Jaeseo Lee, Seong-Jun Song, Sung Min Park, Choong-Mo Nam, Young-Se Kwon, H. Yoo
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引用次数: 25
Abstract
A 1.0 Gb/s 80 dB/spl Omega/ fully-differential TIA uses 0.25 /spl mu/m CMOS and multichip-on-oxide (MCO) process. MCO enables integration of PD, TIA, and planar inductors of Q=21.1 for shunt peaking on an oxidized silicon substrate. Interchannel crosstalk and power dissipation are <-40 dB and 27 mW, respectively. MCO and TIA chips are 5/spl times/5 mm/sup 2/ and 0.7/spl times/1 mm/sup 2/, respectively.