Cheng-Han Wu, S. Brems, D. Yudistira, D. Cott, A. Milenin, K. Vandersmissen, A. Maestre, A. Centeno, J. Campenhout, C. Huyghebaert, M. Pantouvaki
{"title":"Graphene electro-absorption modulators integrated at wafer-scale in a CMOS fab","authors":"Cheng-Han Wu, S. Brems, D. Yudistira, D. Cott, A. Milenin, K. Vandersmissen, A. Maestre, A. Centeno, J. Campenhout, C. Huyghebaert, M. Pantouvaki","doi":"10.23919/VLSICircuits52068.2021.9492495","DOIUrl":null,"url":null,"abstract":"We demonstrate graphene electro-absorption modulators (EAM) integrated on 300mm wafers. The integration is based on imec’s 300mm silicon photonics platform and the full integration sequence is using standard CMOS production tools expect for the 6-inch CVD graphene growth and transfer, transferred by Graphenea. 164x TE EAMs were measured per wafer and demonstrate 90% yield with modulation efficiency (ME) of 41±5.6 dB/mm for 8V voltage swing, after process optimization. The 3dB bandwidth of the EAMs is 14.9±1.2 GHz for the device with 50µm active length. Both parameters show comparable performance with lab-based devices, obtained on coupons using similar CVD graphene. This work paves the way to enable high-volume manufacturing of 2D-material-based photonics devices.","PeriodicalId":106356,"journal":{"name":"2021 Symposium on VLSI Circuits","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 Symposium on VLSI Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/VLSICircuits52068.2021.9492495","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We demonstrate graphene electro-absorption modulators (EAM) integrated on 300mm wafers. The integration is based on imec’s 300mm silicon photonics platform and the full integration sequence is using standard CMOS production tools expect for the 6-inch CVD graphene growth and transfer, transferred by Graphenea. 164x TE EAMs were measured per wafer and demonstrate 90% yield with modulation efficiency (ME) of 41±5.6 dB/mm for 8V voltage swing, after process optimization. The 3dB bandwidth of the EAMs is 14.9±1.2 GHz for the device with 50µm active length. Both parameters show comparable performance with lab-based devices, obtained on coupons using similar CVD graphene. This work paves the way to enable high-volume manufacturing of 2D-material-based photonics devices.
我们展示了集成在300mm晶圆上的石墨烯电吸收调制器(EAM)。集成基于imec的300mm硅光子学平台,完整的集成顺序使用标准的CMOS生产工具,用于6英寸CVD石墨烯的生长和转移,由石墨烯转移。经过工艺优化,每块晶圆测量了164x TE eam,并显示出90%的良率,调制效率(ME)为41±5.6 dB/mm。当器件的有效长度为50µm时,eam的3dB带宽为14.9±1.2 GHz。这两个参数都显示出与使用类似CVD石墨烯的基板上获得的实验室设备相当的性能。这项工作为实现基于2d材料的光子器件的大批量生产铺平了道路。